• 专利标题:   Repairing graphene membrane on support e.g. copper involves chamber to receive graphene layer that includes hole; applying initiator/activator through hole to produce/activate initiator layer; and growing a polymer to produce polymer plug.
  • 专利号:   US2014030482-A1, WO2014018031-A1, US9156702-B2
  • 发明人:   MILLER S A, DUERKSEN G L
  • 专利权人:   MILLER S A, DUERKSEN G L, EMPIRE TECHNOLOGY DEV LLC
  • 国际专利分类:   C01B031/04, B01D069/12, B01D071/02, B01D065/10, B01D069/10, B05D003/00, B82Y030/00, B82Y040/00
  • 专利详细信息:   US2014030482-A1 30 Jan 2014 C01B-031/04 201413 Pages: 15 English
  • 申请详细信息:   US2014030482-A1 US13809049 08 Jan 2013
  • 优先权号:   WOUS048154, US13809049

▎ 摘  要

NOVELTY - Method (M1) for repairing graphene (54) involves chamber (72) to receive a layer of graphene on support (52), where the layer of graphene includes hole; applying initiator through hole to functionalize the support and produce initiator layer (104) on support; applying activator through hole to initiator layer to activate initiator layer; and growing a polymer from initiator layer using activator, where growth of polymer is effective to produce polymer plug (58) in hole. USE - For repairing of graphene membrane on support comprising copper, nickel, silica, alumina or polymer (claimed). The repaired graphene membrane may be transferred to another surface. ADVANTAGE - The graphene membranes are produced using less expensive manufacturing processes. The membranes may be used without sacrificing graphene's relatively higher permeability/low membrane resistance or reducing graphene's low gas transport selectivity. The higher defect count membranes may be repaired by plugging undesired holes, while remainder of membrane may still be unobstructed and used. The produced polymer plugs are robust to handle dry or wet etching process, where the plug may maintain good adhesion to graphene membrane in dry etching process. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following: (1) system to repair layer of graphene including hole comprising chamber to receive layer of graphene on support; first and second container, where first container includes initiator and second container includes activator; where the chamber is configured to operate with first container to apply initiator through hole to functionalize support and to produce initiator layer on support; second container to apply activator through hole to initiator layer to activate the initiator layer; and second container to grow polymer from initiator layer using activator to produce polymer plug in hole; and (2) structure comprising support; where layer of graphene on support, the layer of graphene includes pores and at least one hole region; and polymer plug grown from support and in at least one hole region of layer of graphene. DESCRIPTION OF DRAWING(S) - The figure shows system that can be utilized to implement repair of graphene membrane on support. Support (52) Repairing graphene (54) Polymer plug (58) Chamber (72) Initiator layer (104)