▎ 摘 要
NOVELTY - Etchant composition comprises sulfuric acid, hydrogen peroxide, N-heterocyclic aromatic compound, aromatic boric acid and purified water. The N-heterocyclic aromatic compound contains benzoimidazole or benzotriazole. The aromatic boric acid is made of phenyl boric acid. USE - The etchant composition is useful for manufacturing graphene with low sheet resistance (claimed). ADVANTAGE - The composition reduces sheet resistance of graphene prepared through chemical vapor deposition.