▎ 摘　　要

NOVELTY - The method involves forming a graphene oxide film on a base and performing laser micro/nano processing of the graphene oxide, to form a micro-nano structure on the base. The base is made of glass, quartz, silicon or silicon oxide. The graphene oxide is dissolved in the solvent having concentration of about 0.1-20mg/ml, to obtain a graphene oxide film of thickness 0.3 nm-2 mm. The graphene oxide is processed in the atmosphere containing air, noble gas, hydrogen, oxygen, ammonia or in vacuum condition. USE - Photofabrication method. ADVANTAGE - The formation of various patterning micro-nano structures can be enabled, by using a simple technique. The conducting capacity of the micro-nano structure can be controlled, since the reduction degree of the graphene material is varied by changing the irradiation level of laser beam. The adjustment of the graphene structure can be enabled, by changing the processing atmosphere. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view illustrating the photofabrication process.