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  • 专利标题:   Graphene etching apparatus comprises adsorption chamber, induction coil, buffer chamber, feeder, desorption chamber, exhaust and a graphene substrate.
  • 专利号:   KR2013011648-A
  • 发明人:   LIM W S, OH J S, YEOM G
  • 专利权人:   UNIV SUNGKYUNKWAN RES BUSINESS FOUND
  • 国际专利分类:   B01J019/28, C01B031/02
  • 专利详细信息:   KR2013011648-A 30 Jan 2013 C01B-031/02 201356 Pages: 9
  • 申请详细信息:   KR2013011648-A KR072953 22 Jul 2011
  • 优先权号:   KR072953

▎ 摘　　要

NOVELTY - A graphene etching apparatus comprises an adsorption chamber, an induction coil, a buffer chamber, a feeder, a desorption chamber, an exhaust and a graphene substrate. USE - Graphene etching apparatus. ADVANTAGE - The graphene etching apparatus has high reliability. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for graphene etching method.