▎ 摘　　要

NOVELTY - Method for manufacturing a self-standing graphene oxide or reduced graphene oxide film having 0.4-4 mu m thickness, involves (a) preparing an aqueous dispersion comprising 0.1-30 gl-1 graphene oxide or reduced graphene oxide, (b) depositing aqueous dispersion on a flat substrate coated with a polymeric film dissolvable in organic solvents and unsolvable in water to form a wet film having a thickness of 1 mu m and 3.5 mm, (c) drying wet film to obtain a graphene oxide or reduced graphene oxide film on the polymeric film, (d) separating polymeric film from the flat substrate, (e) placing polymeric film coated with the graphene oxide or reduced graphene oxide film in a support frame, (f) showering polymeric film with an organic solvent to dissolve the polymeric film to obtain a framed graphene oxide or reduced graphene oxide film, and (g) separating the graphene oxide or reduced graphene oxide film from the frame to obtain the product. USE - The method is used for manufacturing a self-standing graphene oxide or reduced graphene oxide film in electronic, nuclear, medical, energy, oil and gas, water treatment, chemical or steelmaking applications, and for manufacturing electronic device, power generation device, heat exchanger block for chemical process plant and arc furnace electrode. ADVANTAGE - The method allows production of large self-standing (reduced) graphene oxide films with specific thickness and high quality.