• 专利标题:   New substituted aryl compounds useful for producing nanostructures, preferably nanoribbons i.e. graphene or graphene nanoribbons.
  • 专利号:   WO2016149633-A1, AU2016232761-A1, CA2978502-A1, KR2017139538-A, EP3271346-A1, JP2018511591-W, US2018244596-A1
  • 发明人:   CHALIFOUX W A, SPROUL K C, YANG W, CHALIFOUX W, SPROUL K
  • 专利权人:   UNIV NEVADA SYSTEM HIGHER EDUCATION, UNIV NEVADA SYSTEM HIGHER EDUCATION, UNIV NEVADA SYSTEM HIGHER EDUCATION
  • 国际专利分类:   C07C043/205, C07C043/235, C07D333/18, C07D209/68, C08G061/10, C07C013/66, C07C015/20, C07C205/06, C07C211/50, C07C022/08, C07C025/22, C07C309/68, C07C041/18, C07F001/02, C07F007/08, C08G061/02, C07C015/38, C07D333/08, C07C025/24, C07C041/20, C07C201/12, C07C209/68, C07C005/09, C07C017/354, C07C303/30
  • 专利详细信息:   WO2016149633-A1 22 Sep 2016 201667 Pages: 115 English
  • 申请详细信息:   WO2016149633-A1 WOUS023179 18 Mar 2016
  • 优先权号:   US135692P, US182351P, CA2978502, US15558978

▎ 摘  要

NOVELTY - Substituted aryl compounds (I) are new. USE - (I) are useful for producing nanostructures, preferably nanoribbons i.e. graphene or graphene nanoribbons. ADVANTAGE - (I) provide nanoribbons with high yield and without any harsh reaction conditions. DETAILED DESCRIPTION - Substituted aryl compounds of formula (I) are new. R1=H, halo, aliphatic, (hetero)aryl or heteroaliphatic; R1a=aryl (optionally substituted with at least one of aliphatic, alkoxy, amide, amine, thioether, haloalkyl, NO2, halo, silyl, cycloaliphatic or aryl) or an electron donating group; n=1-3; and m=0-1000. An INDEPENDENT CLAIM is also included for the preparation of (I).