• 专利标题:   Graphene oxide/light-cured composite resin used in stereolithography rapid prototyping, is formed by dispersing graphene oxide in two-phase photocurable resin.
  • 专利号:   CN103819656-A, CN103819656-B
  • 发明人:   WEI Y, LIN R, MA F
  • 专利权人:   UNIV QINGDAO SCI TECHNOLOGY
  • 国际专利分类:   B29C067/24, C08F290/06, C08G059/24, C08G059/36, C08K003/04
  • 专利详细信息:   CN103819656-A 28 May 2014 C08G-059/24 201449 Pages: 10 Chinese
  • 申请详细信息:   CN103819656-A CN10054242 18 Feb 2014
  • 优先权号:   CN10054242

▎ 摘  要

NOVELTY - A graphene oxide/light-cured composite resin is formed by dispersing graphene oxide in two-phase photocurable resin. The content of dispersed graphene oxide is 0.1-1 wt.%, with respect to content of composite resin. The photocurable resin comprises oligomer and photoinitiator. USE - Graphene oxide/light-cured composite resin is used in stereolithography rapid prototyping (claimed). ADVANTAGE - The graphene oxide/light-cured composite resin has increased breaking extending rate, maximum bending strain, high impact strength and excellent mechanical property. The stereolithography rapid prototyping is efficiently carried out using graphene oxide/light-cured composite resin in the scanning power of 200-850 mV and scan speed of 1000-6000 mm/s. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for preparation of graphene oxide/light-cured composite resin. Graphene oxide is dissolved in a solvent, to obtain graphene oxide suspension. Oligomer and solvent are mixed in the ratio of 1:1, and dissolved to obtain oligomer/solvent mixture. The obtained graphene oxide suspension and oligomer/solvent mixture are mixed, ultrasonically cleaned for 0.5-36 hours, magnetically stirred at 20-40 degrees C, and photoinitiator/solvent solution of photoinitiator and photocurable resin are added in the mass ratio of 0.01-0.1, evaporated and the mixture was stirred to obtain graphene oxide/photocurable resin composite.