• 专利标题:   Graphene interlayer structure integrated photoelectric detector, has interlayer structure connected between second light absorption layer and first light absorbing layer, and graphene layer provided with metal electrode.
  • 专利号:   CN110224041-A, CN110224041-B
  • 发明人:   SHEN J, WU Q, WEI X, FENG S, ZHOU D, TANG L, LENG C, NIE C, ZHANG Z, WU J, SHI H
  • 专利权人:   CHINESE ACAD SCI CHONGQING GREEN INTEL, CHINESE ACAD SCI CHONGQING GREEN INTEL
  • 国际专利分类:   H01L031/101, H01L031/11, H01L031/18
  • 专利详细信息:   CN110224041-A 10 Sep 2019 H01L-031/101 201982 Pages: 7 Chinese
  • 申请详细信息:   CN110224041-A CN10504453 12 Jun 2019
  • 优先权号:   CN10504453

▎ 摘  要

NOVELTY - The detector has a first light-absorbing layer (1) i.e. single crystal Silicon sheet provided with a graphene layer (2). An interlayer structure is connected between a second light absorption layer (3) and the first light absorbing layer. The graphene layer is provided with a metal electrode. The graphene layer is connected with a high gain carrier transport channel that is connected with the first light-absorbing layer and the second light-absorbing layer, where material of the second light absorption layer and the graphene layer are a quantum dot material, and the first light- absorbing layer absorbs light of a layer material. USE - Graphene interlayer structure integrated photoelectric detector. ADVANTAGE - The detector can simultaneously realize different response to different wave bands of light, and improves response effect, simplifies photoelectric detector preparation process, and realizes strong practicality. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a photoelectric detector constructing method. DESCRIPTION OF DRAWING(S) - The drawing shows a block diagram of a graphene interlayer structure integrated photoelectric detector. Light-absorbing layers (1,3) Graphene layer (2)