▎ 摘　　要

NOVELTY - Graphene solution having concentration of 0.01-6 wt.% and silicon solution having concentration of 0.05-1 wt.% are prepared. Graphene layers and conductive silicon thin films are alternately deposited on surface of metal electrode using prepared solutions by electron beam vapor deposition at substrate temperature of 100-500 degrees C and vacuum of 10-7-10-4 Pa, to obtain composite anode material. The total number of graphene layers and conductive silicon thin films is more than 2. USE - Preparation of composite anode material (claimed). ADVANTAGE - The method enables preparation of composite anode material having high capacitance and coulombic efficiency.