• 专利标题:   Forming graphene layer on quartz substrate comprises melting portion of quartz substrate, diffusing a form of carbon into the melted portion to form carbon and quartz mixture and precipitating single or few layer graphene out of the mixture.
  • 专利号:   US2013323158-A1, US10000384-B2
  • 发明人:   XU X, WEI D, YE P
  • 专利权人:   PURDUE RES FOUND, PURDUE RES FOUND
  • 国际专利分类:   C01B031/04, C03C017/22, C01B032/184, B82Y030/00, B82Y040/00, C30B029/18
  • 专利详细信息:   US2013323158-A1 05 Dec 2013 C01B-031/04 201381 Pages: 15 English
  • 申请详细信息:   US2013323158-A1 US906057 30 May 2013
  • 优先权号:   US655540P, US906057

▎ 摘  要

NOVELTY - Method (I) of forming at least one graphene layer on a quartz substrate, comprises: (a) providing a quartz substrate (140); (b) melting a portion of the quartz substrate; (c) diffusing a form of carbon into the melted portion to form a carbon and quartz mixture; and (d) precipitating single or few layer graphene out of the carbon and quartz mixture. USE - The methods are useful for forming at least one graphene layer on a quartz substrate. ADVANTAGE - The method: allows for growing graphene directly on the quartz substrate, with much higher temperature in a confined area, while maintaining the rest of the substrate at the room temperature; and is simple, rapid, single-step, and controllable. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a method (II) of forming at least one graphene layer, comprising the step (a) as per se, (b1) forming a photoresist layer (142) portion on an upper surface of the quartz substrate, where the photoresist layer portion includes the form of carbon, (c1) decomposing the photoresist layer portion to release the form of carbon, and (d1) coalescing the form of carbon into at least one graphene layer on the quartz substrate. DESCRIPTION OF DRAWING(S) - The figure shows a quartz wafer positioned on the upper layer of the photoresist layer above the portion of the quartz substrate. Quartz substrate (140) Photoresist layer (142) Quartz wafer (146)