▎ 摘　　要

NOVELTY - Selective graphene etching involves setting wavelength, power, and scanning path of laser, focusing the laser through a lens array to form a laser focusing spot, scanning a preset area of the substrate sample surface with the laser focusing spot, completely etching away a thin layer of graphene in the preset area on the surface of the substrate sample, and forming a pattern on the surface of the thin layer of graphene. USE - Selective graphene etching. ADVANTAGE - The method prevents damage, does not affect the performance of graphene, and enables complete etching of graphene film. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for device for selective graphene etching.