• 专利标题:   Large area graphene preparation device has second heater installed below chamber, and vacuum cover that surrounds furnace, first heater and second heater and is connected to vacuum unit to form vacuum around furnace.
  • 专利号:   CN110499496-A
  • 发明人:   JIN J
  • 专利权人:   XICHI TECHNOLOGY SHANGHAI CO LTD
  • 国际专利分类:   C23C016/26, C23C016/455, C23C016/46
  • 专利详细信息:   CN110499496-A 26 Nov 2019 C23C-016/26 201995 Pages: 14 Chinese
  • 申请详细信息:   CN110499496-A CN10481370 18 May 2018
  • 优先权号:   CN10481370

▎ 摘  要

NOVELTY - The device (100) has a furnace (141) installed on the upper portion of a main unit. One side is connected to an air inlet, and the other side is connected to the vacuum chamber. A first heater (160) is mounted on the upper part of the chamber. A second heater (170) is installed below the chamber. A vacuum cover (120) surrounds the furnace, the first heater and the second heater and is connected to the vacuum unit to form a vacuum around the furnace. USE - Large area graphene preparation device. ADVANTAGE - The vacuum degree is accurately maintained, and the vacuum leakage is minimized such that high-quality large-area graphene is synthesized. DESCRIPTION OF DRAWING(S) - The drawing shows a sectional view of the large-area graphene preparation device. Large area graphene preparation device (100) Vacuum cover (120) Furnace (141) First heater (160) Second heater (170)