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  • 专利标题:   Improved nanoporous copper thin film consists of graphene layer on surface of nanoporous copper.
  • 专利号:   CN104789934-A
  • 发明人:   LIU J, PAN D
  • 专利权人:   UNIV SHANGHAI SCI TECHNOLOGY
  • 国际专利分类:   B32B015/04, B32B003/24, B32B009/04, B82Y030/00, B82Y040/00, C23C014/16, C23C014/35, C23C014/58, C23C024/00, C23C028/00, C23F001/02
  • 专利详细信息:   CN104789934-A 22 Jul 2015 C23C-014/35 201567 Pages: 7 Chinese
  • 申请详细信息:   CN104789934-A CN10150818 01 Apr 2015
  • 优先权号:   CN10150818

▎ 摘　　要

NOVELTY - An improved nanoporous copper thin film consists of a graphene layer on a surface of nanoporous copper. USE - Improved nanoporous copper thin film (claimed). ADVANTAGE - The improved nanoporous copper thin film has excellent specific capacity and electrochemical cyclic stability. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for preparation of nanoporous copper thin film.