▎ 摘　　要

NOVELTY - Preparing graphene transparent electrode film involves cleaning base body ultrasonically with acetone and putting the pre-treated substrate into the plasma sputtering furnace. The base is covered with heat insulation cover. The distance between the substrate and the target is the pole distance of the workpiece. On heating, a layer of plasma glow discharge is formed on the surface of the substrate, and a plasma glow discharge region is formed on the surface of the target. The film formation efficiency is enhanced by the overlapping of two plasma glow discharge regions. USE - Method for preparing graphene transparent electrode film (claimed). DETAILED DESCRIPTION - Preparing graphene transparent electrode film involves cleaning base body ultrasonically with acetone and putting the pre-treated substrate into the plasma sputtering furnace. The base is covered with heat insulation cover. The distance between the substrate and the target is the pole distance of the workpiece. On heating, a layer of plasma glow discharge is formed on the surface of the substrate, and a plasma glow discharge region is formed on the surface of the target. The film formation efficiency is enhanced by the overlapping of two plasma glow discharge regions. The plasma plasma sputtering furnace is opened and assorted with cold water pump to maintain a high vacuum state in the furnace using a mechanical pump. The furnace is filled with argon gas to maintain a vacuum pressure of 15-25 Pascals to remove air from the furnace. The sample is bombarded. The source voltage is adjusted to the test value, so that the workpiece attain the working temperature. The power supply is turned off. The furnace is pumped to ultimate vacuum and cooled down to room temperature to take out the graphene transparent electrode film.