▎ 摘　　要

NOVELTY - A semiconductor device (100) comprises a workpiece (102), a conductive feature formed on the workpiece, an insulating material layer (106) arranged on the conductive feature, a via coupled to the conductive feature and arranged in the insulating material, and a barrier layer arranged on sidewalls of the via proximate the insulating material layer. The barrier layer comprises a material chosen from hydrocarbon, halocarbon, sulfured carbon, silicon carbon, graphite, graphene, amorphous carbon and fullerene. USE - Semiconductor device is used in personal computer, cell phone and digital camera. ADVANTAGE - The semiconductor device is manufactured by simple method. DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view of the semiconductor device. Semiconductor device (100) Workpiece (102) Etch stop layer (104) Insulating material layer (106) Photosensitive material (110)