▎ 摘　　要

NOVELTY - Lithography of graphene device involves transferring graphene into a target substrate, spin-coating the polymethylmethacrylate material on a surface of the graphene, subjecting graphene to deep ultraviolet lithography, depositing a metal electrode on the surface of the graphene, dissolving the polymethyl methacrylate material on the surface of the graphene by N-methylpyrrolidone, peeling off excess portion of the metal electrode and washing graphene with isopropanol solution and deionized water. USE - Lithographic method of graphene device (claimed). ADVANTAGE - The method enables reliable and repeatable lithography of graphene device by effectively avoiding contamination of photolithographic photoresist graphene.