• 专利标题:   Graphene-modified platinum electrode for detection of trace amount of heavy metal, is obtained by depositing metal platinum electrode on silicon dioxide substrate and growing graphene on platinum electrode.
  • 专利号:   CN102621199-A, CN102621199-B
  • 发明人:   DING G, JIN Q, TANG F, XIE X, ZHANG F, ZHANG H, ZHAO J
  • 专利权人:   CHINESE ACAD SCI SHANGHAI MICROSYSTEM, SHANGHAI INST MICROSYSTEM INFORMATION
  • 国际专利分类:   G01N027/30, G01N027/48
  • 专利详细信息:   CN102621199-A 01 Aug 2012 G01N-027/30 201282 Pages: 13 Chinese
  • 申请详细信息:   CN102621199-A CN10059601 08 Mar 2012
  • 优先权号:   CN10059601

▎ 摘  要

NOVELTY - A graphene-modified platinum electrode is obtained by depositing metal platinum electrode on silicon dioxide substrate and growing graphene on platinum electrode. USE - Graphene-modified platinum electrode is used for detection of trace amount of heavy metal (claimed). ADVANTAGE - The graphene-modified platinum electrode has high detection sensitivity and heavy metal limit value of 0.05 mg/l. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following: (1) manufacture of graphene-modified platinum electrode. Silicon chip is placed in 30% of cleaning liquid containing hydrogen peroxide and sulfuric acid in a ratio of 1:5, heated for 20 minutes, cooled using deionized water and dried under nitrogen atmosphere to remove water vapor. The resulting silica is subjected to thermal oxidation on surface of silica and silicon dioxide is grown on surface of silica to obtain silicon dioxide substrate. The silicon dioxide substrate is coated with AZ4620-type photoresist, spin coating process is performed. The processed silicon chip is placed in oven at 80 degrees C, photoetching is performed for 30 minutes and exposed for 30-40 seconds. The exposed silicon chip is placed in developing solution containing AZ400K-type developer and water in a ratio of 1:3, shaken for 40 seconds, washed using deionized water for 10 seconds and dried under nitrogen atmosphere. The resulting material is subjected to plasma treatment, immersed in acetone and residual photoresist is washed and the remaining amount of platinum, is washed using alcohol. The graphene is grown on platinum electrode to obtain graphene-modified platinum electrode; and (2) detection of trace amount of heavy metal, which involves subjecting dilute sulfuric acid to stripping voltametry using graphene-modified molybdenum electrode as working electrode, silver/silver chloride electrode as reference electrode and molybdenum wire electrode as counter electrode.