• 专利标题:   Preparing vertical emission luminous device based on graphene and medium distributed Bragg reflector comprises extending non-doped gallium nitride, preparing dielectric distributed Bragg reflector on non-doped gallium nitride layer, and forming epitaxial bulk layer on gallium nitride merged layer.
  • 专利号:   CN115498074-A
  • 发明人:   LI J, WANG J, ZHANG Y, LIANG M, LIU Z, SONG W, YI X
  • 专利权人:   INST SEMICONDUCTORS CHINESE ACAD SCI
  • 国际专利分类:   H01L033/00, H01L033/02, H01L033/44, H01L033/46
  • 专利详细信息:   CN115498074-A 20 Dec 2022 H01L-033/00 202304 Chinese
  • 申请详细信息:   CN115498074-A CN10682878 18 Jun 2021
  • 优先权号:   CN10682878

▎ 摘  要

NOVELTY - Preparing vertical emission luminous device based on graphene and medium distributed Bragg reflector (DBR) comprises extending non-doped gallium nitride (GaN) on substrate, preparing a dielectric DBR on the non-doped GaN layer, covering a graphene layer on the medium DBR, etching the graphene layer and the dielectric DBR exposes the non-doped GaN layer, forming a patterned underlying dielectric DBR, epitaxially forming a GaN merged layer on the exposed region of the non-doped GaN layer and the patterned underlying dielectric DBR, forming an epitaxial bulk layer on the GaN merged layer, forming a conductive layer on the epitaxial body layer, and preparing a patterned top-layer dielectric DBR on the conductive layer to obtain the vertical emitting light emitter. USE - Preparing vertical emission luminous device based on graphene and medium DBR. ADVANTAGE - The method enables to prepare vertical emitting light emitting device based on graphene and medium DBR, which greatly reduces the production cost of the device. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for vertical emission luminous device based on graphene and medium DBR prepared by the above method. DESCRIPTION OF DRAWING(S) - The drawing shows schematically shows a vertical emission luminous device based on graphene and medium DBR. 10Conductive layer 11Patterning top medium dbr 12Epitaxial main body layer 13Patterned bottom layer dielectric dbr 00Substrate 01Non-doped gan layer 02Medium dbr 03Graphene layer 04GaN combined layer 05N type doped gan electron injection layer 06Quantum well structure active area 07P-doped algan electron barrier layer 08P-type doped GaN hole injection layer 09Heavily doped p-type GaN ohm contact layer