• 专利标题:   Method for manufacturing pyroelectric infrared detector graphene absorbing layer, involves and processing surface of graphene infrared absorption layer to form nano-shaped infrared sensitive absorbing layer.
  • 专利号:   CN104465850-A, CN104465850-B
  • 发明人:   LI W, LIANG Z, JIANG Y, LIU Z, WANG T, ZHENG X
  • 专利权人:   UNIV CHINA ELECTRONIC SCI TECHNOLOGY
  • 国际专利分类:   H01L031/101, H01L031/18
  • 专利详细信息:   CN104465850-A 25 Mar 2015 H01L-031/101 201536 Pages: 9 Chinese
  • 申请详细信息:   CN104465850-A CN10701309 28 Nov 2014
  • 优先权号:   CN10701309

▎ 摘  要

NOVELTY - The method involves obtaining a pyroelectric crystal substrate. A nickel chromium alloy layer is deposited at a side of the pyroelectric crystal substrate to form an upper electrode by utilizing a radio frequency magnetic sputtering process. A graphene infrared absorption layer is deposited on the upper electrode. A lower electrode is bonded with a high impedance substrate. A surface of the graphene infrared absorption layer is processed to form a nano-shaped infrared sensitive absorbing layer. The pyroelectric crystal substrate is selected as a lithium wafer. USE - Method for manufacturing a pyroelectric infrared detector graphene absorbing layer (claimed). ADVANTAGE - The method enables improving surface compactness, absorption coefficient and heat response performance and reducing heat loss. DESCRIPTION OF DRAWING(S) - The drawing shows a flow diagram illustrating a method for manufacturing a pyroelectric infrared detector graphene absorbing layer.'(Drawing includes non-English language text)'