▎ 摘　　要

NOVELTY - Fabricating an etched surface on a substrate comprises: depositing at least one layer of graphene on the surface on the substrate; patterning the deposited at least one layer of graphene; and exposing the surface on the substrate to an acid to etch the surface on the substrate. USE - The method is useful for fabricating an etched surface on a substrate (claimed). ADVANTAGE - The method provides a device which is easy to fabricate. DETAILED DESCRIPTION - Fabricating an etched surface on a substrate comprises: depositing at least one layer of graphene on the surface on the substrate; patterning the deposited at least one layer of graphene; and exposing the surface on the substrate to an acid to etch the surface on the substrate.