• 专利标题:   Electrode structure for semiconductor device e.g. FET used in electronic device, has graphene layer that is configured to contact one of semiconductor layer and electrode containing metal.
  • 专利号:   US2013075700-A1, KR2013032105-A, JP2013070051-A, CN103022106-A, US8912530-B2, JP5982234-B2, KR1830782-B1, CN103022106-B
  • 发明人:   YANG H, PARK S, CHUNG H, HEO J, YANG H J, PARK S J, CHUNG H J, HEO J S, HUH J, JUNG H
  • 专利权人:   SAMSUNG ELECTRONICS CO LTD, SAMSUNG ELECTRONICS CO LTD, SAMSUNG ELECTRONICS CO LTD, SAMSUNG ELECTRONICS CO LTD
  • 国际专利分类:   B82Y099/00, H01L029/12, H01L029/772, H01L021/336, H01L029/78, H01L021/28, H01L029/417, H01L029/47, H01L029/06, H01L029/16, H01L029/45, H01L031/00
  • 专利详细信息:   US2013075700-A1 28 Mar 2013 H01L-029/772 201323 Pages: 8 English
  • 申请详细信息:   US2013075700-A1 US431031 27 Mar 2012
  • 优先权号:   KR095813

▎ 摘  要

NOVELTY - The electrode structure has graphene layers (231,232) that are provided on a semiconductor layer. An electrode is made of metal provided on the graphene layer. The graphene layer is configured to contact one of semiconductor layer and electrode containing metal. The semiconductor layer is comprised of graphene layer configured to change Schottky energy barrier between semiconductor layer and electrode containing metal, based on impurity of the semiconductor layer. USE - Electrode structure for semiconductor device such as FET (claimed) used in electronic device. ADVANTAGE - The graphene layer can be configured to reduce Schottky energy barrier between the substrate and electrode containing metal based on the impurity of the semiconductor layer changing the work function of graphene layer. The driving voltage can be decreased due to the reduction in contact resistance, and also size of the electrode region can be reduced due to the reduction in the contact resistance so that FET can be made small. DETAILED DESCRIPTION - INDEPENDENT CLAIMS are included for the following: (1) FET; and (2) contact structure. DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view of the FET. FET (200) Semiconductor substrate (210) Source region (221) Drain region (222) Graphene layers (231,232)