• 专利标题:   Manufacture of graphene film or pattern involves printing individually graphene oxide ink and reducing agent ink on substrate, reacting, and forming graphene film or pattern.
  • 专利号:   WO2013035900-A1, KR2013027195-A, KR1324104-B1
  • 发明人:   CHOI K C, KIM K J, AHN S I
  • 专利权人:   KOREA ADV INST SCI TECHNOLOGY, KOREA ADVANCED INST SCI TECHNOLOGY
  • 国际专利分类:   C01B031/02, G01N027/26, H01B001/04, H01L021/331, H01L031/042, B01J019/10
  • 专利详细信息:   WO2013035900-A1 14 Mar 2013 C01B-031/02 201322 Pages: 15
  • 申请详细信息:   WO2013035900-A1 WOKR006650 08 Sep 2011
  • 优先权号:   KR090635

▎ 摘  要

NOVELTY - Manufacture of graphene film or pattern involves printing individually graphene oxide ink and reducing agent ink on a substrate, reacting, and forming graphene film or pattern. USE - Manufacture of graphene film or pattern used for active layer for electrode of electric component display device, solar cell, transparency thin film speaker, transistor and chemical sensor (claimed). Uses include but are not limited to liquid crystal display, plasma display device and organic electroluminescent. ADVANTAGE - The method economically, efficiently and rapidly provides graphene film or pattern. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for graphene film or pattern. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view of the inkjet printing method of the graphene film or pattern. (Drawing includes non-English language text)