• 专利标题:   Controllably forming Bernal-stacked graphene layers involves cleaning surface of catalyst, annealing, applying carbon source onto the cleaned and annealed surface of the catalyst in reaction chamber, and growing the graphene layers on it.
  • 专利号:   US2014178688-A1, US10053366-B2
  • 发明人:   TOUR J M, SUN Z, RAJI A O
  • 专利权人:   UNIV RICE WILLIAM MARSH, UNIV RICE WILLIAM MARSH
  • 国际专利分类:   C01B031/04, C23C016/26, C01B032/186
  • 专利详细信息:   US2014178688-A1 26 Jun 2014 C01B-031/04 201444 Pages: 29 English
  • 申请详细信息:   US2014178688-A1 US104588 12 Dec 2013
  • 优先权号:   US736249P, US104588

▎ 摘  要

NOVELTY - Controllably forming (M1) Bernal-stacked graphene layers involves cleaning a surface of a catalyst; annealing the surface of the catalyst; applying a carbon source onto the cleaned and annealed surface of the catalyst in a reaction chamber; and growing the Bernal-stacked graphene layers on the surface of the catalyst in the reaction chamber, where the number of formed Bernal-stacked graphene layers is controllable as a function of at least one growth parameter. USE - For controllably forming Bernal-stacked graphene layers; for Bernal-stacked graphene film (claimed); and for physical and optoelectronic applications. ADVANTAGE - The method is effective, scalable, and controllable for forming Bernal-stacked graphene layers that show distinct electronic band structures. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for Bernal-stacked graphene film (F1) comprising Bernal-stacked graphene layers, where the Bernal-stacked graphene layers are uniform in structure, and are in polycrystalline form.