▎ 摘　　要

NOVELTY - A photocatalytic hydrogen production device comprises a two-layer structure including a silicon layer and a graphene layer. The graphene layer is bonded to the silicon layer. The thickness of the graphene layer is 20 nm or less. The graphene layer has crosslinking degree of 1-5%. The graphene layer is prepared by formulating graphene oxide into aqueous solution of graphene oxide with concentration of 0.5-10 mu g/mL, filtering, attaching resultant graphene oxide film to suction filtration substrate in a closed container, coating melted solid transfer agent on surface of graphene oxide film, cooling, heat-treating at 300 degrees C and 1 degrees C/minute, heat-preserving for 6-12 hours, spraying layer of 30% or less metal nanoparticles on surface of the graphene film by magnetron sputtering, subjecting to chlorination treatment at 800-1200 degrees C, processing at 2000 degrees C, and attaching resultant on silicon substrate. The metal nanoparticles include titanium, tungsten, iron, magnesium and molybdenum. USE - Photocatalytic hydrogen production device. ADVANTAGE - The photocatalytic hydrogen production device has excellent light transmittance, light absorption performance and conversion performance.