• 专利标题:   Preparing 2,3-butanediol from ethanol, comprises adding or not adding solvent into reactor, adding ethanol, semiconductor photocatalyst and metal salt additive, replacing atmosphere in reaction system with inert atmosphere, reacting with light, and purifying.
  • 专利号:   CN116120150-A
  • 发明人:   LUO N, GAO Z, WANG F
  • 专利权人:   CAS DALIAN CHEM PHYSICAL INST
  • 国际专利分类:   C07C029/34, C07C031/20
  • 专利详细信息:   CN116120150-A 16 May 2023 C07C-029/34 202351 Chinese
  • 申请详细信息:   CN116120150-A CN11339250 12 Nov 2021
  • 优先权号:   CN11339250

▎ 摘  要

NOVELTY - Preparing 2,3-butanediol (II) from ethanol, comprises adding or not adding solvent into reactor, adding ethanol (I), semiconductor photocatalyst and metal salt additive, replacing the atmosphere in the reaction system with an inert atmosphere, reacting with light, and purifying to obtain final product. USE - The method is useful in preparing 2,3-butanediol from ethanol. ADVANTAGE - The method: improves the selectivity of 2,3-butanediol and the conversion rate of ethanol through metal salt additives; utilizes cheap and easily available raw materials; and has high atom economy, excellent reaction selectivity and mild reaction conditions. DETAILED DESCRIPTION - Preparing 2,3-butanediol of formula (II) from ethanol, comprises adding or not adding solvent into reactor, adding ethanol of formula (I), semiconductor photocatalyst and metal salt additive, replacing the atmosphere in the reaction system with an inert atmosphere, reacting with light, and purifying to obtain final product; where the semiconductor photocatalyst includes semiconductor carrier and co-catalyst, the co-catalyst is loaded on semiconductor carrier, and the co-catalyst includes gold, silver, copper, iron, palladium, platinum, nickel, ruthenium, rhodium, iridium, cadmium, indium, bismuth, nickel phosphide, cobalt(II) phosphide, molybdenum disulfide, tungsten disulfide, copper(II) sulfide, graphene, and/or cobalt sulfide, the mass ratio between co-catalyst and semiconductor carrier is 0.001-0.2, preferably 0.01-0.1, and the metal salt additives include metal organic salts and metal inorganic salts of lithium, sodium, potassium, calcium, strontium, barium, aluminum, gallium, indium, vanadium, chromium, niobium, molybdenum, tungsten, manganese, iron, cobalt, copper, zinc, lanthanum, cerium, and/or praseodymium.