• 专利标题:   Eco-friendly process of producing defect-free, high specific surface area graphene by aqueous-based exfoliation, comprises e.g. dissolving sodium cholate in distilled water by stirring, shear mixing of exfoliated graphene worms and drying.
  • 专利号:   IN201941008201-A
  • 发明人:   GEDELA V, NUGURU R
  • 专利权人:   NANOSPAN INDIA PRIVATE LTD
  • 国际专利分类:   C01B032/19
  • 专利详细信息:   IN201941008201-A 14 May 2021 C01B-032/19 202149 Pages: 17 English
  • 申请详细信息:   IN201941008201-A IN41008201 01 Mar 2019
  • 优先权号:   IN41008201

▎ 摘  要

NOVELTY - Eco-friendly process of producing defect-free, high specific surface area graphene by aqueous-based exfoliation, comprises dissolving 0.1-0.4 g concentration of sodium cholate in 500 ml distilled water under stirring condition, shear mixing of exfoliated graphene worms at room temperature for 1-4 hours, where the ratio of exfoliated graphene worms to sodium cholate being is 1:12.5-1:50 and at rpm rate is 5000-6000, allowing the suspension to stay at room temperature overnight, collecting 400 ml or 80% of upper solution through a pipette, centrifuging the collected upper solution for 10-40 minutes, where the centrifugation rpm is 1000-4000, collecting the supernatant, filtering the collected solution through 0.45 mu m polyvinylidene fluoride membranes, washing with distilled water, and drying the obtained graphene in air. USE - The method is useful for eco-friendly process of producing defect-free, high specific surface area graphene by aqueous-based exfoliation. ADVANTAGE - The method: has less cost; and is eco-friendly.