• 专利标题:   Preparing graphene strip involves using Hummers method to obtain oxidized graphite, where selective modified line detect is used on surface containing oxygen function group during graphite oxidation.
  • 专利号:   CN102001642-A, CN102001642-B
  • 发明人:   CHENG H, ZHAO J, WU Z, GAO L, REN W, LIU B
  • 专利权人:   CHINESE ACAD SCI INST METAL RES, CHINESE ACAD SCI METAL RES INST
  • 国际专利分类:   C01B031/02
  • 专利详细信息:   CN102001642-A 06 Apr 2011 C01B-031/02 201145 Pages: 10 Chinese
  • 申请详细信息:   CN102001642-A CN10013577 02 Sep 2009
  • 优先权号:   CN10013577

▎ 摘  要

NOVELTY - Graphene strip preparation involves using Hummers method to obtain oxidized graphite. A selective modified line detect is used on surface containing oxygen function group during the graphite oxidization to prepare graphene with surface line defect by high-temperature quick expansion striping, heat reduction, solvent dispersion and centrifugal separation. Graphene strip is cut by ultrasonic wave cutting and chemical reduction process. A high-speed centrifugal method is used to remove uncut big graphene to obtain graphene strip with controllable layer number and width. USE - Method for preparing graphene strip (claimed). ADVANTAGE - The method provides graphene strip in a simple and cost-effective.