• 专利标题:   Preparing graphene thin film involves supplying substrate and then applying substrate on surface of carbon source layer in controllable manner to obtain uniform thickness layer.
  • 专利号:   CN104477903-A
  • 发明人:   KANG X, ZENG S, ZUO Q
  • 专利权人:   SHANGHAI INTEGRATED CIRCUIT RES DEV CE
  • 国际专利分类:   C01B031/04, C03C017/22, C04B041/50
  • 专利详细信息:   CN104477903-A 01 Apr 2015 C01B-031/04 201552 Chinese
  • 申请详细信息:   CN104477903-A CN10822933 22 Dec 2014
  • 优先权号:   CN10822933

▎ 摘  要

NOVELTY - Preparing graphene thin film involves supplying a substrate and then applying the substrate on the surface of carbon source layer in a controllable manner to obtain uniform thickness layer. The obtained carbon layer is heated and then performing a chemical reaction with heated material to obtain the graphene film layer. USE - Method for preparing graphene thin film (claimed). ADVANTAGE - The method enables to prepare graphene thin film has controlled carbon layer uniformity and thickness precisely, and with high quality.