▎ 摘　　要

NOVELTY - Preparing photosensitive heat-resistant graphite-based material comprises (i) preparing liquid phase graphene, (ii) taking liquid phase graphene, adding 1-3 wt.% silver halide, 3-5 wt.% graphene oxide, 3-5 wt.% silica, ultrasonically dispersing at 0-5 degrees C, allowing to stand for 1-2 hours in an environment at -5 degrees C to -2 degrees C, (iii) taking the resulting material into a sealed reaction container, evaporating the solvent at 100-200 degrees C to obtain the dried mixture i.e. product. USE - The photosensitive material is useful in display, keyboard and touch pad (claimed). ADVANTAGE - The photosensitive material: has decrease in resistance along with increase in temperature (i.e. resistance is more than 35,000 Omega at 10 degrees C, resistance is 26,000 Omega at 100 degrees C), resistance difference of 12000-12500 Omega in absence of sunlight, and short light response time.