• 专利标题:   Producing reduced graphene oxide by providing carbon material, providing substrate adjacent to provided carbon material, heating carbon material, and depositing carbonaceous material on substrate.
  • 专利号:   WO2020045911-A1, KR2020023989-A, KR2146525-B1
  • 发明人:   KIM G H
  • 专利权人:   UNIST ULSAN NAT SCI TECHNOLOGY INST
  • 国际专利分类:   C01B032/194, C01B032/198, C23C016/26
  • 专利详细信息:   WO2020045911-A1 05 Mar 2020 C01B-032/198 202027 Pages: 21
  • 申请详细信息:   WO2020045911-A1 WOKR010825 26 Aug 2019
  • 优先权号:   KR100576

▎ 摘  要

NOVELTY - Method for producing reduced graphene oxide involves providing a carbon material, providing a substrate adjacent to the provided carbon material, heating the carbon material at 600 degrees C or higher, and depositing the carbonaceous material on the substrate to form a reduced graphene oxide thin film, where the carbon material is a solid seed lock. USE - The method is useful for producing reduced graphene oxide (claimed). ADVANTAGE - The method produces high-quality reduced graphene oxide having excellent sheet resistance, high transparency and improved physical and chemical stability, in a simple manner without using toxic chemicals and complicated processes.