• 专利标题:   Patterning self assembled reduced graphene oxide film used in carbon nano-tubes, and electrical and electronic field, involves adding reducing agent to graphene oxide, and heating in heating device positioned for liquid absorption.
  • 专利号:   KR1617963-B1
  • 发明人:   AHN S I, JUNG J R, YONG W K
  • 专利权人:   UNIV SILLA
  • 国际专利分类:   C01B031/04
  • 专利详细信息:   KR1617963-B1 03 May 2016 C01B-031/04 201634 Pages: 12 English
  • 申请详细信息:   KR1617963-B1 KR161458 19 Nov 2014
  • 优先权号:   KR161458

▎ 摘  要

NOVELTY - Patterning self assembled reduced graphene oxide film involves adding reducing agent to graphene oxide and heating in the heating device positioned for the liquid absorption. The reduced graphene intermediate solution is added to substrate at pre-determined temperature. The substrate blocks the airflow and reduced graphene intermediate solution is coated on the substrate. The coated substrate is positioned on the pattern device at the upper part of the assembly membrane. The moisture at the lower part of the assembly membrane is dried at certain pressure. USE - Method for patterning self assembled reduced graphene oxide film used in carbon nano-tubes, and electrical and electronic field (claimed). ADVANTAGE - The method enables to patterning self assembled reduced graphene oxide film that has good mechanical property and wide range of applications.