▎ 摘　　要

NOVELTY - Dry cleaning of copper substrate involves subjecting the copper substrate to an aerobic atmosphere for oxidation to form oxide layer and removing the oxide layer from the surface of the substrate. USE - Dry cleaning of copper substrate for preparing chemical vapor deposited graphene (claimed). ADVANTAGE - The method is simple, controlled easily and provides substrate with high reproducibility. The copper substrate obtained effectively reduces the nucleation density, defects and provide graphene with high quality.