• 专利标题:   Method for validating e.g. graphene, utilized for basic material industries, involves showing material in low energy domain of Raman spectrum by performing whether Raman analysis of material is two-dimensional material or not.
  • 专利号:   KR2018020792-A, KR1913675-B1
  • 发明人:   LEE J K, JEE K K
  • 专利权人:   KOREA INST SCI TECHNOLOGY
  • 国际专利分类:   G01J003/44, G01N021/65
  • 专利详细信息:   KR2018020792-A 28 Feb 2018 G01J-003/44 201818 Pages: 8
  • 申请详细信息:   KR2018020792-A KR105722 19 Aug 2016
  • 优先权号:   KR105722

▎ 摘  要

NOVELTY - The method involves determining material from generation. The material is shown in a low energy domain of Raman spectrum by performing whether Raman analysis of the material is two-dimensional (2D) material or not. A position of the generation is formed with two atomic layers. The thickness of the material is determined at three atomic layers. The position of the generation is shown when thickness of the material is less than 1 nm. The thickness of the material is greater than 2 nm to prevent the position of the generation from being shown. USE - Method for validating two-dimensional (2D) material e.g. graphene, manganese disulfide, tungsten disulfide, molybdenum disulfide, and tungsten diselenide (all claimed) utilized for basic material industries. ADVANTAGE - The method enables readily providing and verifying 2D material with analysis so as to save time and cost of the Raman analysis and reduce size of elements as exaggeration. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a graphene material validation method. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic view illustrating a 2D material validating method. '(Drawing includes non-English language text)'