▎ 摘　　要

NOVELTY - Removing a polymethylmethacrylate (PMMA) from a graphene surface, where PMMA layer covers a graphene layer located on a substrate, comprises: subjecting the PMMA layer to a deep UV light irradiation, to facilitate the removal of PMMA layer from the graphene surface; treating an irradiated PMMA layer in order to remove PMMA layer from the graphene surface; and drying a cleaned graphene layer located on a substrate in a stream of nitrogen gas. The irradiation is performed by a photo-exposure of the PMMA layer with the UV-C band source. The treatment is performed by a development of photoexposed PMMA layer in an alcohol/deionized water mixture. USE - The method is useful for removing a polymethylmethacrylate from a graphene surface. ADVANTAGE - The method: provides effective, reliable, accessible and easy to use polymethylmethacrylate removal method for cleaning graphene without changing its properties; improves the cleaning efficiency; does not impact the properties of cleaned graphene; does not use hazard chemicals (i.e. toxic or carcinogenic); requires no additional washing after development; utilizes low-pressure mercury vapor lamp that is inexpensive and easy to use and maintain; and utilizes alcohol/water mixture which exhibits excellent properties as a developer with enhanced dissolution rate, thus avoiding residuals introduction on a surface of graphene. DETAILED DESCRIPTION - INORGANIC CHEMISTRY - Preferred Method: In the method: whole area of the PMMA layer is photoexposed for 2-6 hours, depending on the layer thickness, with the low-pressure mercury vapor lamp with the emission spectrum of 100-280 nm, with a peak at less than or equal to of 253.7 nm; the photoexposed PMMA layer is developed in the alcohol/water mixture comprising methanol/water, ethanol/water or isopropanol/water; and the photoexposed PMMA layer is developed in isopropanol/water mixture having an isopropanol/water volume ratio of 70:30 to 75:25.