• 专利标题:   Formation of metal oxide thin film on graphene for e.g. inverted organic solar cell, involves dissolving metal precursor in solvent, ultrasonically treating, dispersing droplets, and adsorbing droplet on graphene with carrier gas.
  • 专利号:   KR2013014183-A, KR1802946-B1
  • 发明人:   JIN S H, SIK S G, YEONG C J, KIM S W, SHIN H J, CHOI J Y, SHIN K S
  • 专利权人:   SAMSUNG ELECTRONICS CO LTD, UNIV SUNGKYUNKWAN RES BUSINESS FOUND, UNIV SUNGKYUNKWAN RES BUSINESS FOUND
  • 国际专利分类:   C23C016/22, C23C016/448, H01L021/205, H01L031/042, H01L031/04
  • 专利详细信息:   KR2013014183-A 07 Feb 2013 C23C-016/448 201356 Pages: 14
  • 申请详细信息:   KR2013014183-A KR076144 29 Jul 2011
  • 优先权号:   KR076144

▎ 摘  要

NOVELTY - A metal precursor compound is dissolved in a low boiling point solvent to obtain a metal precursor solution. The metal precursor solution is subjected to ultrasonic treatment, and metal oxide precursor droplets are dispersed in a solvent. Droplets and graphene are supplied to a chamber, and droplet is adsorbed on graphene with carrier gas to form metal oxide thin film on graphene. USE - Formation of metal oxide thin film on graphene for device e.g. transparent energy electric power generating element, transparent photoelectric device or inverted organic solar cell (all claimed). ADVANTAGE - The metal oxide thin film is formed on graphene at low temperature with high crystallization without damaging graphene.