• 专利标题:   Preparing graphene, comprises e.g. placing sheet-type metal substrate in a reaction chamber, contacting with carbon source material, and irradiating one side surface of sheet-type metal substrate by using laser beam, and irradiating again.
  • 专利号:   CN104264130-A, CN104264130-B
  • 发明人:   GAO J, LI B, JIANG J, LIU R, TENG Y, WANG Q
  • 专利权人:   BEIKUANG MAGNETIC MATERIAL SCI TECHNOL, BGRIMM MAGNETIC MATERIAL TECHNOLOGY CO
  • 国际专利分类:   C01B031/04, C23C016/26, C23C016/48, C23C020/06, C01B032/184, C01B032/186
  • 专利详细信息:   CN104264130-A 07 Jan 2015 C23C-016/48 201519 Pages: 12 Chinese
  • 申请详细信息:   CN104264130-A CN10499232 25 Sep 2014
  • 优先权号:   CN10499232

▎ 摘  要

NOVELTY - Preparing graphene, comprises placing a sheet-type metal substrate in a reaction chamber, contacting with carbon source material, and irradiating one side surface of the sheet-type metal substrate by using laser beam, and then irradiating the other side surface of the sheet-type metal substrate using laser beam, to obtain the product, where the side opposite to the surface of the sheet-type metal substrate irradiated is contacted with the carbon source material. USE - The method is useful for preparing graphene (claimed). ADVANTAGE - The method can achieve the processing of micro-nano size structure of the product; and is not only suitable for various wavelengths of the pulsed laser beam, and continuous laser beam, but also utilizes gaseous carbon source and solid carbon source as carbon source materials. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a device for preparing graphene, comprising reaction chamber, a substrate supporting frame, a laser emitter, a vacuumizing device and a gas input pipe, where the substrate supporting frame is fixed in the inner part of the reaction chamber, and the sheet-shaped metal substrate is suspended on the substrate supporting frame located in the reaction chamber, and the laser emitter is set on the outer side of the reaction chamber, and the laser emitter irradiates laser beam on the surface of the sheet-shaped metal substrate perpendicularly, and the vacuumizing device is connected to the inner side of the reaction chamber, and used for vacuumizing the reaction chamber, and a gas input pipe is connected to the reaction chamber, and used for inputting rare gases, reducing gas or carbon source gas. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic representation of the device utilized in the above mentioned method.