• 专利标题:   Optical material for realizing tunable dual-wavelength plasma nanolaser, has graphene structure unit that is periodically arranged on gain medium to form two-dimensional array, and that is provided with pi-type graphene resonator.
  • 专利号:   CN111755945-A
  • 发明人:   FAN C, REN P
  • 专利权人:   UNIV ZHENGZHOU
  • 国际专利分类:   H01S005/10, H01S005/34
  • 专利详细信息:   CN111755945-A 09 Oct 2020 H01S-005/10 202086 Pages: 7 Chinese
  • 申请详细信息:   CN111755945-A CN10495150 03 Jun 2020
  • 优先权号:   CN10495150

▎ 摘  要

NOVELTY - The material has a gain medium that is arranged on a substrate. A graphene structure unit is periodically arranged on the gain medium to form a two-dimensional array. The graphene structure unit includes a pi-type graphene resonator and a hollow rectangular graphene resonator. An arrangement period of the structure unit on the substrate along x-axis and y-axis is in preset value. A long arm of the pi-type graphene resonator is a continuous strip, arranged continuously along x-axis direction. A material used in the graphene structure unit is graphene with a thickness of 1 nanometer (nm). The substrate is made of a silicon dioxide dielectric material. USE - Optical material for realizing tunable dual-wavelength plasma nanolaser (claimed). ADVANTAGE - The plasma nanolaser has a simple structure and strong operability. The structure of the plasma nanolaser greatly compensates for the inherent loss and the resonance intensity is amplified by orders of magnitude. A low-threshold stimulated radiation is realized and dual-wavelength selective excitation is realized by adjusting the gain coefficient. The intensity tunable laser phenomenon is realized by adjusting the polarization angle of the incident light. DESCRIPTION OF DRAWING(S) - The drawing shows a schematic diagram of the tunable dual-wavelength plasma nanolaser.