• 专利标题:   Laser-induced based method for processing graphene micro/nano structure, involves processing oxide-graphene-base material sandwich structure samples by laser direct writing system, destroying graphene by carbothermal reduction reaction.
  • 专利号:   CN107244669-A
  • 发明人:   ZHANG X, XU J, SHI B, XU X, LIU Y, REN M, CAI W, WU Q, YI R
  • 专利权人:   UNIV NANKAI
  • 国际专利分类:   B82Y030/00, C01B032/194
  • 专利详细信息:   CN107244669-A 13 Oct 2017 C01B-032/194 201776 Pages: 9 Chinese
  • 申请详细信息:   CN107244669-A CN10461601 14 Jun 2017
  • 优先权号:   CN10461601

▎ 摘  要

NOVELTY - The laser-induced based method for processing graphene micro/nano structure, involves preparing graphene micro-nano structure, transferring graphene onto substrate material, evaporating oxide, processing oxide-graphene-base material sandwich structure samples by laser direct writing system, destroying the graphene by carbothermal reduction reaction with oxide under the laser light, and retaining the remaining graphene, and removing residual oxide to obtain graphene micro-nano structure. USE - Laser-induced based method for processing graphene micro/nano structure (claimed). ADVANTAGE - The laser-induced based method avoids secondary sputtering during ion beam machining and achieves high-precision graphene structure and pattern processing. DETAILED DESCRIPTION - Laser-induced based method for processing graphene micro/nano structure, involves (S1) preparing graphene micro-nano structure, (S2) transferring graphene onto substrate material, (S3) evaporating the oxide to obtain oxide-graphene-base material sandwich structure sample, (S4) processing oxide-graphene-base material sandwich structure samples by laser direct writing system, destroying the graphene by carbothermal reduction reaction with oxide under the laser light in the region beyond the threshold light intensity, and retaining the remaining graphene, and (S5) removing residual oxide to obtain graphene micro-nano structure. An INDEPENDENT CLAIM is included for laser-induced based system for processing graphene micro/nano structure, which comprises light source generating system, beam parameter adjustment system and mechanical movement system. The light beam emitted by the light source generating system is adjusted to the desired beam for micro/nano structure processing, by the beam parameter adjustment system. The mechanical movement system is provided to process the beam relative to the displacement between the samples.