▎ 摘　　要

NOVELTY - Manufacturing ultra-thin thermal reactive substrate-free film comprises (a) mixing conductive modifier, epoxy resin and acetone in ratio of 1:5:9, adding 1-5% chitosan of total epoxy resin, stirring to 55-75℃ at a speed of 100-500revolutions/minutes for 20-30 minutes to obtain base material-free main agent, (b) adding 5-10% formaldehyde modified body in base material-free main agent, stirring at speed of 100- 300revolutions/minute for 30-40 minutes to obtain the improved material, (c) adding 1-5% organic modified interface agent to modified material, stirring to 75-85℃ at speed of 200-500revolution/minute for 1-2 hours, performing proton irradiation treatment at a power of 100-500 w for 3-5 hours to obtain the coating cloth and (d) coating the coating cloth to the thickness of 1-5 mm, finishing coating, drying and rolling to obtain substrate-free film. USE - The method is useful for manufacturing ultra-thin thermal reactive substrate-free film. ADVANTAGE - The film has excellent corrosion resistance, conductive performance and compatibility.