• 专利标题:   Method for producing membrane for hemodialysis, involves irradiating laser beam onto photo-mask for forming pores of predetermined pattern on graphene thin film.
  • 专利号:   KR2017090904-A, KR1810470-B1
  • 发明人:   HYEKYUNG J, CHANGHO L, JAEYOUL J
  • 专利权人:   LG ELECTRONICS INC
  • 国际专利分类:   A61M001/16, A61M001/34, B01D071/02, B05D007/00, B23K026/382, B23K026/402, C01B031/04
  • 专利详细信息:   KR2017090904-A 08 Aug 2017 A61M-001/16 201763 Pages: 11
  • 申请详细信息:   KR2017090904-A KR011866 29 Jan 2016
  • 优先权号:   KR011866

▎ 摘  要

NOVELTY - The method involves forming a graphene thin film (210) on the copper substrate (220). A photo-mask (230) on which several pores having diameter of 1-10 mu m are formed in a predetermined pattern is coated on the graphene thin film. The laser beam is irradiated onto the photo-mask for forming the pores of predetermined pattern on graphene thin film. USE - Method for producing membrane (claimed) for hemodialysis. ADVANTAGE - The hemodialysis membrane having thin layer is provided, so that the separation efficiency is high and the filtration accuracy is high due to the pores formed in a uniform pattern. The hemodialysis membrane composed of graphene having high physical and chemical stability and biostability, is provided. DESCRIPTION OF DRAWING(S) - The drawing shows a sectional view illustrating the process for producing membrane for hemodialysis. (Drawing includes non-English language text) Graphene thin film (210) Copper substrate (220) Photo-mask (230) Glass/silicon wafer (240)