• 专利标题:   Preparing graphene layer on the surface of the sensor substrate comprises e.g. using copper foil as substrate, preparing graphene layer, spin-coating, removing excess graphene and support film, and vacuum heating.
  • 专利号:   CN108147398-A, WO2019100674-A1
  • 发明人:   FANG R, GAO Z, LI H, LIN W, HE W, LI L
  • 专利权人:   UNIV SHENZHEN, UNIV SHENZHEN
  • 国际专利分类:   C01B032/186, C01B032/194, G01N027/00, G01N027/12
  • 专利详细信息:   CN108147398-A 12 Jun 2018 C01B-032/186 201852 Pages: 9 Chinese
  • 申请详细信息:   CN108147398-A CN11459734 28 Dec 2017
  • 优先权号:   CN21610599, CN11459734, CN21878299

▎ 摘  要

NOVELTY - Preparing graphene layer on the surface of the sensor substrate comprises e.g. (a) using copper foil as substrate, preparing graphene layer attached to the substrate by chemical vapor deposition, and spin-coating polymethylmethacrylate, (b) removing excess graphene and support film, and removing the substrate by redox reaction, and causing the graphene layer, and adhering to the support film on one side, (c) placing the unsupported side of the graphene layer on the surface of the treated sensor substrate in deionized water, contacting the two and subjecting to heat treatment until the graphene layer is bonded to the surface of the substrate, (d) removing the support film and cleaning the surface of the graphene layer, (e) repeating the steps (a), and (c) to obtain graphene layer with support film, and placing the unsupported film side on the graphene layer on the surface of the sensor substrate, and (f) removing the support film, and vacuum heating. USE - The method is useful for preparing graphene layer on the surface of the sensor substrate. ADVANTAGE - The method has sensor sensitivity and fast desorption. DETAILED DESCRIPTION - Preparing graphene layer on the surface of the sensor substrate comprises (a) using copper foil as substrate, preparing graphene layer attached to the substrate by chemical vapor deposition, and spin-coating polymethylmethacrylate (PMMA) to obtain support film, (b) removing excess graphene and support film, and removing the substrate by redox reaction, and causing the graphene layer, and adhering to the support film on one side, (c) placing the unsupported side of the graphene layer on the surface of the treated sensor substrate in deionized water, contacting the two and subjecting to heat treatment until the graphene layer is bonded to the surface of the substrate, (d) removing the support film and cleaning the surface of the graphene layer, (e) repeating the steps (a), and (c) to obtain graphene layer with support film, and placing the unsupported film side on the graphene layer on the surface of the sensor substrate that has been subjected to the above steps in the deionized water, and (f) removing the support film, vacuum heating, and combining two layers of graphene, generating two layers and transferring to cover the sensor substrate having band gap of the first graphene layer.