• 专利标题:   Method for manufacturing a micropattern conductive hydrogel, involves preparing a hydrogel substrate that has a graphene oxide, and graphene oxide contained in the hydrogel substrate is reduced on which the pattern structure is formed.
  • 专利号:   KR2020067263-A
  • 发明人:   LEE J, JUNG S H, PARK J G, CHOI J
  • 专利权人:   GWANGJU INST SCI TECHNOLOGY
  • 国际专利分类:   A61L027/38, A61L027/44, A61L027/52
  • 专利详细信息:   KR2020067263-A 12 Jun 2020 A61L-027/52 202053 Pages: 19
  • 申请详细信息:   KR2020067263-A KR089365 31 Jul 2018
  • 优先权号:   US655207P

▎ 摘  要

NOVELTY - The method involves preparing (S100) a hydrogel substrate that has a graphene oxide. A pattern structure is formed (S200) on the hydrogel substrate containing the graphene oxide by irradiating a femtosecond laser to the hydrogel substrate containing the graphene oxide. The graphene oxide contained in the hydrogel substrate is reduced (S300) on which the pattern structure is formed. The the pattern structure comprises a tissue structure mimic pattern. A femtosecond laser is irradiated which is having a frequency of 10 Hertz or more. The reducing solution comprises melatonin, amino acids, polyphenols or ascorbic acid. USE - Method for manufacturing a micropattern conductive hydrogel (Claimed). ADVANTAGE - The electrical signal exchange between cells becomes smooth, and it is possible to cultivate excellent cells. DESCRIPTION OF DRAWING(S) - The drawing shows a flow chart representation of method of manufacturing a micropattern conductive hydrogel. Preparing a hydrogel substrate comprising graphene oxide (S100) Forming a pattern structure on the hydrogel substrate containing the graphene oxide by irradiating a femtosecond laser to the hydrogel substrate containing the graphene oxide (S200) Reducing the graphene oxide contained in the hydrogel substrate on which the pattern structure is formed (S300)