▎ 摘　　要

NOVELTY - The utility model claims a kind of graphene film is used for forming the transparent conductive film a sputtering coating device, comprising a vacuum cavity, the target and the substrate, wherein the substrate is connected with the vacuum cavity, the vacuum cavity is grounded, wherein the sputtering coating device further comprises a target material and the substrate and the neutral atom can pass through the anode device and a voltage output device, wherein a voltage output end, high voltage output end anode of the voltage output device. This utility model claims a sputtering coating method of forming a transparent conductive electrode layer on the graphene thin film and without damaging the graphene film layer as target, and capable of obtaining a uniform coating film, to reduce the resistivity of the transparent conductive film.