• 专利标题:   Process for annealing zinc oxide substrate transfer graphene, involves adopting high-temperature annealing mode, repairing graphene defect generated during substrate transfer process, and removing impurities during transfer process.
  • 专利号:   CN102931077-A
  • 发明人:   WANG D, ZHANG J, HAO Y, HAN D, NING J, YAN Y, CHAI Z
  • 专利权人:   UNIV XIDIAN
  • 国际专利分类:   H01L021/324
  • 专利详细信息:   CN102931077-A 13 Feb 2013 H01L-021/324 201359 Pages: 8 Chinese
  • 申请详细信息:   CN102931077-A CN10408199 22 Oct 2012
  • 优先权号:   CN10408199

▎ 摘  要

NOVELTY - A zinc oxide substrate transfer graphene annealing process involves adopting a high-temperature annealing mode, repairing graphene defect generated during substrate transfer process, and removing impurities that are not removed during transfer process, where a forbidden band is introduced in the graphene. USE - Process for annealing zinc oxide substrate transfer graphene. ADVANTAGE - The process enables effectively removing water molecules and other impurities absorbed on the surface of the graphene due to lower-temperature annealing is adopted in an argon atmosphere, and forming effective contact of the graphene attached on the substrate and the silicon carbide substrate by adopting high-annealing temperature of 1000 degrees C. The process enables providing cleaned surface of the transferred graphene and less defects. DESCRIPTION OF DRAWING(S) - The drawing shows a flowchart illustrating a process for annealing zinc oxide substrate transfer graphene. '(Drawing includes non-English language text)'