• 专利标题:   Production of reduced graphene-gel composite for semiconductor filler, involves performing reduction of graphene oxide and polymerizing dopamine-based monomer by irradiating mixed solution of graphene oxide and dopamine-based monomer.
  • 专利号:   KR2021056061-A, KR2317604-B1
  • 发明人:   GWON H J, LEE M W, LEE N H, KANGCHANGKOO
  • 专利权人:   KOREA ATOMIC ENERGY RES INST
  • 国际专利分类:   C08J003/075, C08J003/20, C08J003/28, C08L065/00
  • 专利详细信息:   KR2021056061-A 18 May 2021 C08J-003/28 202155 Pages: 9
  • 申请详细信息:   KR2021056061-A KR142676 08 Nov 2019
  • 优先权号:   KR142676

▎ 摘  要

NOVELTY - Production of reduced graphene-gel composite involves performing reduction of graphene oxide and polymerizing a dopamine-based monomer by irradiating radiation on mixed solution of graphene oxide and dopamine-based monomer. USE - Production of reduced graphene-gel composite used for semiconductor filler, and shielding human radiation (all claimed). ADVANTAGE - The method is environmentally-friendly, and enables production of reduced graphene-gel composite having excellent dispersibility in an aqueous solution state. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is included for the reduced graphene-gel composite, which comprises reduced graphene oxide, and dopamine-based polymer chemically bonded to the reduced graphene oxide.