• 专利标题:   Threshold value conversion device useful in semiconductor device, comprises dielectric material layer, which located between first and second electrode layer, where metal ion of second electrode layer transferred to first electrode layer.
  • 专利号:   CN113113537-A, WO2022213532-A1, CN113113537-B
  • 发明人:   LI Y, LU Y, LI H, MIAO X
  • 专利权人:   UNIV HUAZHONG SCI TECHNOLOGY, UNIV HUAZHONG SCI TECHNOLOGY
  • 国际专利分类:   H01L045/00, H10N070/20
  • 专利详细信息:   CN113113537-A 13 Jul 2021 H01L-045/00 202165 Pages: 10 Chinese
  • 申请详细信息:   CN113113537-A CN10377419 08 Apr 2021
  • 优先权号:   CN10377419

▎ 摘  要

NOVELTY - Threshold value conversion device comprises a dielectric material layer, which located between a first electrode layer and a second electrode layer. The metal ion of the second electrode layer is transferred to the first electrode layer through the dielectric material layer under action of voltage. The dielectric material layer is a multi-layer stack structure of three layers, where the number of layers in the dielectric material layer is an odd number. The odd number layer is a stoichiometric oxide. The even number layer is an excess oxygen content oxide. USE - The device is useful in a semiconductor device. ADVANTAGE - The device: has high on-state current, high switch ratio, better consistency and durability, simple structure and easy preparation. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for preparing the threshold value conversion device. DESCRIPTION OF DRAWING(S) - The drawing shows a cross-sectional view of the threshold value conversion device.