• 专利标题:   Metallization of PTFE circuit board holes involves preparing liquid phase dispersion graphene solution, soaking PTFE circuit board in graphene solution, volatilizing solvent, and performing chemical copper deposition.
  • 专利号:   CN112423491-A
  • 发明人:   HUANG M, WEN G, LI X
  • 专利权人:   SIHUI FUJI ELECTRONICS TECHNOLOGY CO LTD
  • 国际专利分类:   H05K003/42
  • 专利详细信息:   CN112423491-A 26 Feb 2021 H05K-003/42 202128 Pages: 6 Chinese
  • 申请详细信息:   CN112423491-A CN10000924 04 Jan 2021
  • 优先权号:   CN10000924

▎ 摘  要

NOVELTY - Metallization of PTFE circuit board holes involves preparing liquid phase dispersion graphene solution, soaking PTFE circuit board in graphene solution, volatilizing solvent, performing chemical copper deposition and performing copper electroplating method. USE - Metallization of PTFE circuit board holes. The method can also be used for mirror glass and polyimide materials. ADVANTAGE - The method improves the conductivity of the PTFE material surface and increases the wet ability of water, so that the chemical copper can be deposited on the modified PTFE surface, finally electroplating thickened copper plating, realizing the hole metallization of the PTFE circuit board.