• 专利标题:   Hall sensor structure, has carrier layer provided with side part, and seed layer whose part is removed between carrier layer and graphene layer to form graphene structure of graphene layer, where seed layer is formed on side part.
  • 专利号:   DE102014115071-A1, US2015102807-A1, CN104576917-A, US9714988-B2, CN104576917-B
  • 发明人:   DEHE A, ECKINGER M, KOLB S, RUHL G, DEU A, RUHR G, IKEGINGER M
  • 专利权人:   INFINEON TECHNOLOGIES AG, ECKINGER M, KOLB S, DEHE A, RUHL G, INFINEON TECHNOLOGIES AG, INFINEON TECHNOLOGIES AG
  • 国际专利分类:   H01L027/22, H01L043/06, G01R033/00, G01R033/07, H01L027/092, H01L043/14, G01R033/06
  • 专利详细信息:   DE102014115071-A1 16 Apr 2015 H01L-043/06 201527 Pages: 56 German
  • 申请详细信息:   DE102014115071-A1 DE10115071 16 Oct 2014
  • 优先权号:   US891484P, US514415

▎ 摘  要

NOVELTY - The structure has a carrier layer (102) provided with a first side part. A seed layer is formed on the first side part. A graphene layer (108) is formed on a part of the seed layer. A part of the seed layer is removed between the carrier layer and the graphene layer to form a graphene structure of the graphene layer. A carrier structure is formed over a part of the graphene layer. An encapsulation structure is formed over a part of the carrier structure, where the encapsulation layer comprises borophosphosilicate glass, the carrier structure and the graphene layer enclose volume. USE - Hall sensor structure. ADVANTAGE - The seed layer part is removed between the carrier layer and the graphene layer to form a graphene structure of the graphene layer so as to reduce residue displacement of a Hall element, and increases output power of the Hall sensor with small space requirement and achieves better guard of the Hall sensor before environmental influences, high sensitivity and high precision of the Hall sensor. DETAILED DESCRIPTION - An INDEPENDENT CLAIM is also included for a method for manufacturing a Hall sensor. DESCRIPTION OF DRAWING(S) - The drawing shows a sectional view of a hall sensor structure. Carrier layer (102) Oxide layer (104) Metal film (106) Graphene layer (108)