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  • 专利标题:   Chemical vapor deposition system used for manufacturing graphene, comprises cooling portion which cools grapheme, graphene combiner which synthesizes graphene by chemical vapor deposition, and material supply portion.
  • 专利号:   KR2013141981-A
  • 发明人:   NA D H
  • 专利权人:   SAMSUNG TECHWIN CO LTD
  • 国际专利分类:   C01B031/02, C23C016/44
  • 专利详细信息:   KR2013141981-A 27 Dec 2013 C23C-016/44 201410 Pages: 7
  • 申请详细信息:   KR2013141981-A KR065158 18 Jun 2012
  • 优先权号:   KR065158

▎ 摘　　要

NOVELTY - Chemical vapor deposition system comprises cooling portion which cools grapheme, graphene combiner which synthesizes the graphene by chemical vapor deposition, and material supply portion which feeds the catalyst metal. USE - Chemical vapor deposition system is used for manufacturing graphene (claimed).