• 专利标题:   Preparing wafer/graphene/poly 4-vinylpyridine/polypyrrole-gold nanocomposite material for detection of organic small molecules, involves using silica-coated silicon wafer as substrate, and then functionalizing amino group.
  • 专利号:   CN106496913-A, CN106496913-B
  • 发明人:   XING G, WANG W, ZOU H, SHANG M
  • 专利权人:   UNIV NINGBO, UNIV NINGBO
  • 国际专利分类:   C08F226/06, C08F292/00, C08G073/06, C08K003/08, C08L051/10, C08L079/04
  • 专利详细信息:   CN106496913-A 15 Mar 2017 C08L-051/10 201728 Pages: 9 Chinese
  • 申请详细信息:   CN106496913-A CN10859161 19 Sep 2016
  • 优先权号:   CN10859161

▎ 摘  要

NOVELTY - Preparing wafer/graphene/poly 4-vinylpyridine/polypyrrole-gold nanocomposite material involves using silica-coated silicon wafer as substrate, and then functionalizing amino group to obtain an amino-modified silicon wafer. The ethanolic solution of graphene oxide is dropped on the silica gel seal to obtain wafer/graphene oxide composite. The wafer/graphene oxide composite is soaked into a sealed tube containing 4-vinylpyridine monomer, and then irradiated with ultraviolet light for 30-180 minutes. The wafer is taken out and rinsed with a chloroform solution. USE - Method for preparing wafer/graphene/poly 4-vinylpyridine/polypyrrole-gold nanocomposite material (claimed) for detection of organic small molecules. DETAILED DESCRIPTION - Preparing wafer/graphene/poly 4-vinylpyridine/polypyrrole-gold nanocomposite material involves using silica-coated silicon wafer as substrate, and then functionalizing amino group to obtain an amino-modified silicon wafer. The ethanolic solution of graphene oxide is dropped on the silica gel seal to obtain wafer/graphene oxide composite. The wafer/graphene oxide composite is soaked into a sealed tube containing 4-vinylpyridine monomer, and then irradiated with ultraviolet light for 30-180 minutes. The wafer is taken out and rinsed with a chloroform solution to obtain a silicon wafer/graphene/poly 4-vinylpyridine composite. The silicon wafer/graphene/poly 4-vinylpyridine composite is immersed in an aqueous chloroauric acid solution for 5-6 hours, and then taken out and washed with deionized water to obtain a wafer/graphene/poly 4-vinylpyridine composite. The wafer/graphene/poly 4-vinylpyridine composite is soaked in pyrrole for 10-180 minutes to obtain the desired product.